Ukushisa okungeniswayo kwe-Metalorganic Chemical Vapor Deposition (MOCVD) ama-reactors ubuchwepheshe obuhloselwe ukuthuthukisa ukusebenza kahle kokushisisa kanye nokunciphisa ukuhlangana kazibuthe okuyingozi ne-gas inlet. Ama-reactors e-MOCVD avamile ane-induction-heat-heating MOCVD avame ukuba nekhoyili yokungeniswa etholakala ngaphandle kwegumbi, okungase kubangele ukushisa okungasebenzi kahle kanye nokuphazamiseka kazibuthe okungaba khona ohlelweni lokulethwa kwegesi. Izinto ezintsha zakamuva ziphakamisa ukuthuthwa noma ukuklama kabusha lezi zingxenye ukuze kuthuthukiswe inqubo yokushisisa, ngaleyo ndlela kuthuthukiswe ukufana kokusatshalaliswa kwezinga lokushisa ku-wafer yonkana futhi kuncishiswe imiphumela engemihle ehlobene nezinkundla kazibuthe. Le ntuthuko ibalulekile ekuzuzeni ukulawula okungcono kwenqubo yokubeka, okuholela kumafilimu ekhwalithi ephezulu ye-semiconductor.
Ukushisa i-MOCVD Reactor nge-Induction
I-Metalorganic Chemical Vapor Deposition (MOCVD) iwuhlelo olubalulekile olusetshenziswa ekwenziweni kwezinto ezisetshenziswa yi-semiconductor. Kubandakanya ukufakwa kwamafilimu amancanyana asuka kumanduleli anegesi aye ku-substrate. Izinga lala mafilimu lincike kakhulu ekufaneni nasekulawuleni izinga lokushisa ngaphakathi kwe-reactor. Ukushisa kwe-induction kuye kwavela njengesixazululo esiyinkimbinkimbi sokuthuthukisa ukusebenza kahle kanye nomphumela wezinqubo ze-MOCVD.
Isingeniso Sokushisisa Okungeniswa Ku-MOCVD Reactors
Ukushisa kwe-induction kuyindlela esebenzisa izinkambu ze-electromagnetic ukushisa izinto. Kumongo we-MOCVD reactor, lobu buchwepheshe buveza izinzuzo ezimbalwa kunezindlela zokushisisa zendabuko. Ivumela ukulawula izinga lokushisa okunembe kakhudlwana nokufana kuyo yonke i-substrate. Lokhu kubalulekile ekuzuzeni ukukhula kwefilimu kwekhwalithi ephezulu. 
Izinzuzo Zokushisisa Okungeniswayo
Ukusebenza Okuthuthukisiwe Kokushisa: Ukushisa kwe-induction kunikeza ukusebenza kahle okuthuthukisiwe ngokufudumeza ngokuqondile i-susceptor (isibambi se-substrate) ngaphandle kokushisisa lonke igumbi. Le ndlela yokushisisa eqondile inciphisa ukulahleka kwamandla futhi ithuthukise isikhathi sokuphendula esishisayo .
Ukwehliswa Kwenhlanganisela Yezibuthe Eziyingozi: Ngokuthuthukisa idizayini yekhoyili yokungeniswa kanye negumbi le-reactor, kungenzeka ukunciphisa ukuhlangana kazibuthe okungathinta kabi izinto zikagesi ezilawula i-reactor kanye nekhwalithi yamafilimu afakiwe .
Ukusabalalisa Kwezinga Lokushisa Okufanayo: Ama-reactors avamile e-MOCVD avame ukulwa nokusatshalaliswa kwezinga lokushisa okungelona igama elifanayo kuyo yonke i-substrate, kube nomthelela omubi ekukhuleni kwefilimu. Ukushisa kwe-induction, ngokuklama ngokucophelela kwesakhiwo sokushisa, kungathuthukisa kakhulu ukufana kokusabalalisa izinga lokushisa.
Design Innovations
Izifundo zakamuva kanye nemiklamo igxile ekunqobeni imikhawulo evamile Ukushisa ukufakelwa kuma-reactors e-MOCVD. Ngokwethula imiklamo yenoveli ye-susceptor, efana ne-susceptor emise okwe-T noma i-slot emise okwe-V, abacwaningi bahlose ukuthuthukisa ukufana kwezinga lokushisa nokusebenza kahle kwenqubo yokushisisa . Ngaphezu kwalokho, izifundo zezinombolo zesakhiwo sokushisisa kumareactor e-MOCVD abandayo zinikeza imininingwane yokuthuthukisa idizayini ye-reactor ukuze isebenze kangcono.
Umthelela Ekwenziweni Kwe-Semiconductor
Ukuhlanganisa induction heat MOCVD reactors imele isinyathelo esibalulekile esiya phambili ekwakhiweni kwe-semiconductor. Ayithuthukisi nje kuphela ukusebenza kahle kanye nekhwalithi yenqubo yokubeka kodwa futhi ifaka isandla ekuthuthukisweni kwemishini ethuthuke kakhulu kagesi neyezithombe.